CLC number: TN304
On-line Access: 2021-10-08
Received: 2020-07-08
Revision Accepted: 2020-11-11
Crosschecked: 2021-09-02
Cited: 0
Clicked: 5361
Citations: Bibtex RefMan EndNote GB/T7714
Fabi Zhang, Jinyu Sun, Haiou Li, Juan Zhou, Rong Wang, Tangyou Sun, Tao Fu, Gongli Xiao, Qi Li, Xingpeng Liu, Xiuyun Zhang, Daoyou Guo, Xianghu Wang, Zujun Qin. Band-gap tunable (GaxIn1−x)2O3 layer grown by magnetron sputtering[J]. Frontiers of Information Technology & Electronic Engineering,in press.https://doi.org/10.1631/FITEE.2000330 @article{title="Band-gap tunable (GaxIn1−x)2O3 layer grown by magnetron sputtering", %0 Journal Article TY - JOUR
磁控溅射法生长的带隙可调谐(GaxIn1−x)2O31桂林电子科技大学广西精密导航技术与应用重点实验室,中国桂林市,541004 2浙江理工大学光电材料与器件中心,浙江省光场调控技术重点实验室,中国杭州市,310018 3上海电机大学机械工程学院,中国上海市,200245 摘要:采用磁控溅射技术和热退火技术在(0001)蓝宝石衬底上制备了多组分氧化物(GaxIn1−x)2O3薄膜,实现可调带隙。详细研究了三元化合物(GaxIn1−x)2O3在整个组成范围内的光学性质和能带结构演化。X射线衍射谱表明,Ga含量在0.11至0.55之间的(GaxIn1−x)2O3薄膜既有立方结构,也有单斜结构,而Ga含量高于0.74的(GaxIn1?x)2O3薄膜只有单斜结构。在可见光范围,所有薄膜透光率均高于86%,吸收边清晰,条纹清晰。此外,随着Ga含量增加,紫外吸收边出现380至250 nm的蓝移,表明禁带能从3.61 eV增加至4.64 eV。实验结果为透明导电化合物半导体(GaxIn1−x)2O3薄膜在光电和光伏行业的应用,特别是在显示器、发光二极管和太阳能电池的应用奠定了基础。 关键词组: Darkslateblue:Affiliate; Royal Blue:Author; Turquoise:Article
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