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Abstract: Perovskite films have fostered significant progress in the field of optoelectronic devices, particularly in solar cells, due to their excellent optoelectronic properties and cost-effective fabrication process. As a promising technique for large-scale industrial production of perovskite films, the blade-coating method has attracted wide attention because of its low cost, large-area coating capability, and simplicity. However, during the blade-coating process, perovskite films often present challenges such as poor film uniformity, high defect density, and uneven crystallization, which greatly affect the efficiency and stability of the devices. In this review, we summarize the application of blade-coating methods to the fabrication of perovskite films, with a focus on analyzing key factors affecting film quality, including precursor solution formulations, solvent characteristics, evaporation rate, crystallization kinetics, and film thickness. In particular, we discuss the impact of environmental factors on the perovskite crystallization process during blade-coating and explore how optimizing the blade-coating process and precursor solution composition can improve film uniformity and device performance. Additionally, we discuss the main challenges and shortcomings in the blade-coating preparation of perovskite films, including defects during large-area fabrication, differences in solvent evaporation rates, and their effects on crystallization quality. Strategies for addressing these issues are proposed. Finally, the prospects of the blade-coating method in large-scale production of perovskite films are outlined, emphasizing the importance of a deeper understanding of perovskite film crystallization mechanisms and the development of novel additives to enhance the performance of perovskite optoelectronic devices and accelerate their industrialization.

影响刮涂过程中钙钛矿薄膜结晶的关键因素

作者：孙静怡，雷博睿，薛晶晶
机构：浙江大学，材料科学与工程学院，硅及先进半导体全国重点实验室，中国杭州，310027
概要：钙钛矿薄膜由于其优异的光电性能和低成本的制造工艺，在光电器件领域，特别是太阳能电池领域取得了重大进展。作为一种很有前景的钙钛矿薄膜大规模工业生产技术，刮涂法因其成本低、大面积涂布能力强、操作简单等优点而受到广泛关注。然而，在涂布过程中，钙钛矿薄膜往往存在薄膜均匀性差、缺陷密度高、结晶不均匀等问题，极大地影响了器件的效率和稳定性。本文综述了刮涂法在钙钛矿薄膜制备中的应用，重点分析了影响薄膜质量的主要因素，包括前驱体溶液配方、溶剂特性、蒸发速率、结晶动力学和薄膜厚度等。特别地，本文讨论了环境因素对刮涂过程中钙钛矿结晶的影响，并探讨了如何优化刮涂工艺和前驱体溶液组成来提高薄膜均匀性和器件性能。此外，本文还讨论了刮涂法制备钙钛矿薄膜面临的主要挑战和缺点，包括大面积制备过程中的缺陷，溶剂蒸发速率的差异以及它们对结晶质量的影响，并提出了解决这些问题的方法。最后，本文展望了刮涂法在钙钛矿薄膜大规模生产中的应用前景，强调了深入了解钙钛矿薄膜结晶机理和开发新型添加剂对提高钙钛矿光电器件性能和推动其产业化的重要性。

关键词：钙钛矿薄膜；刮涂法；晶体生长

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