Full Text:   <1591>

CLC number: TN25

On-line Access: 2009-10-12

Received: 2008-04-30

Revision Accepted: 2008-09-28

Crosschecked: 2009-02-25

Cited: 0

Clicked: 3536

Citations:  Bibtex RefMan EndNote GB/T7714

-   Go to

Article info.
1. Reference List
Open peer comments

Journal of Zhejiang University SCIENCE A 2009 Vol.10 No.10 P.1421~1427

http://doi.org/10.1631/jzus.A0820327


Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application—LED


Author(s):  Mohd Saiful Dzulkefly ZAN, Isamu KATO, Mohammad Syuhaimi AB-RAHMAN, Seri Mastura MUSTAZA

Affiliation(s):  Department of Electrical, Electronic and System Engineering, Faculty of Engineering and Built Environment, Universiti Kebangsaan Malaysia, Bangi 43600, Malaysia; more

Corresponding email(s):   saiful@vlsi.eng.ukm.my

Key Words:  Waveguide, Multilayer, Optical pumping, Light-emitting diode (LED), Double tubed coaxial line microwave plasma chemical vapor deposition (DTCL-MPCVD)


Mohd Saiful Dzulkefly ZAN, Isamu KATO, Mohammad Syuhaimi AB-RAHMAN, Seri Mastura MUSTAZA. Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application—LED[J]. Journal of Zhejiang University Science A, 2009, 10(10): 1421~1427.

@article{title="Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application—LED",
author="Mohd Saiful Dzulkefly ZAN, Isamu KATO, Mohammad Syuhaimi AB-RAHMAN, Seri Mastura MUSTAZA",
journal="Journal of Zhejiang University Science A",
volume="10",
number="10",
pages="1421~1427",
year="2009",
publisher="Zhejiang University Press & Springer",
doi="10.1631/jzus.A0820327"
}

%0 Journal Article
%T Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application—LED
%A Mohd Saiful Dzulkefly ZAN
%A Isamu KATO
%A Mohammad Syuhaimi AB-RAHMAN
%A Seri Mastura MUSTAZA
%J Journal of Zhejiang University SCIENCE A
%V 10
%N 10
%P 1421~1427
%@ 1673-565X
%D 2009
%I Zhejiang University Press & Springer
%DOI 10.1631/jzus.A0820327

TY - JOUR
T1 - Characterization of a-Si:H/SiN multilayer waveguide polarization using an optical pumping application—LED
A1 - Mohd Saiful Dzulkefly ZAN
A1 - Isamu KATO
A1 - Mohammad Syuhaimi AB-RAHMAN
A1 - Seri Mastura MUSTAZA
J0 - Journal of Zhejiang University Science A
VL - 10
IS - 10
SP - 1421
EP - 1427
%@ 1673-565X
Y1 - 2009
PB - Zhejiang University Press & Springer
ER -
DOI - 10.1631/jzus.A0820327


Abstract: 
This paper describes the fabrication of a waveguide and the analysis of its polarization characteristics by applying light-emitting diode (LED) pumping lights to its surface. By using double tubed coaxial line (DTCL) microwave plasma chemical vapor deposition (MPCVD) equipment, an a-Si:H/SiN multilayer waveguide was fabricated whose thickness could be controlled at nanometer order. The main structural material of the waveguide sample consisted of a combination of layers of amorphous silicon hydrogen and silicon nitrate. Once the sample was ready, another major objective of the experiment was to analyze the polarization characteristics of the fabricated waveguide. The idea of the experiment was to analyze how the waveguide reacts when three types of LED (blue, yellow, and red) are radiated onto its surface. The results showed that the fabrication of the a-Si:H/SiN sample is successful. Most effective transmission results, which accord with the polarization characteristics analysis, were obtained.

Darkslateblue:Affiliate; Royal Blue:Author; Turquoise:Article

Reference

[1] Agrawal, G.P., 2002. Fiber Optic Communication Systems (3rd Ed.). Wiley Inter Science, New York.

[2] Goure, J.P., Verrier, I., 2002. Optical Fibre Devices. Institute of Physics Publishing, Bristol & Philadelphia.

[3] Hayt, W.H., Buck, J.A.Jr., 2001. Engineering Electromagnetic (6th Ed.). McGraw Hill, New York.

[4] Japan Society for the Promotion of Science (JSPS), 1983. Thin Film Handbook. Ohm Company, Japan (in Japanese).

[5] Kato, I., 1987. Microwave Plasma CVD―The Frontier of Thin Film Technology 4. Manufacturing Technology Conf., Japan, p.120-125 (in Japanese).

[6] Kato, I., 1989. Amorphous Thin Film Judgment. Kyoritsu Publications, Japan (in Japanese).

[7] Kato, I., Sagisaka, M., Sugai, T., Kamigaichi, T., 2001. Quality of a-Si:H/Si3N4 multilayer films fabricated by double tubed coaxial line type MPCVD system and application of the films to optical circuit element. J. IEICE Trans. Electron., 84(4):245-250 (in Japanese).

[8] Kezuka, H., Kato, I., Saito, R., Suzuki, T., 2002. Characterizations of Si nanocrystals fabricated by microwave plasma CVD system. J. Appl. Plasma Sci., 10:139-144.

[9] Kikuchi, M., 1987. Basic of Amorphous Semiconductor. Kodan Publications, Japan (in Japanese).

[10] Kokubun, Y., 1999. Optical Engineering. Kyoritsu Publications, Japan (in Japanese).

[11] Maeda, M., 2004. Quantum Electronics. Shokodo Company, Japan (in Japanese).

[12] Melchiorri, M., Daldosso, N., Pavesi, L., Pucker, G., Kompocholis, C., 2005. Optical Characterization of Silicon Nitride Low-loss Waveguides in the Near Infrared Range. 2nd IEEE Int. Conf. on Group IV Photonics, p.123-125.

[13] Niira, K., Senta, H., Nishimura, T., Hakuma, H., Komoda, M., Okui, H., Aramaki, K., Okada, Y., Tomita, K., Higuchi, H., 2003. A-Si:H/μc-Si:H Tandem Solar Cell by Novel PECVD Method. Proc. 3rd World Conf. on Photovoltaic Energy Conversion, 2:1852-1855.

[14] Ojima, T., Shinohara, M., Urano, M., Kato, I., Tamaru, N., 2003. Fabrication of the Optical Waveguide with Nano-structure by DTCL-MPCVD Method and the Characteristics. Japan Plasma Science Symp. on Plasma Processing, 20:203-204.

[15] Pierantoni, L., Massaro, A., Rozzi, T., 2005. Accurate modeling of TE/TM propagation and losses of integrated optical polarizer. IEEE Trans. Microw. Theory Techn., 53(6):1856-1862.

[16] Saito, R., Motoyama, Y., Kato, I., Kezuka, H., Suzuki, T., 2003. Film Properties and PL Characteristics of Hydrogenated Amorphous Silicon Nanoball Films Fabricated Using Ar-H2 Mixture Gas Plasma. Japan Plasma Science Symp. on Plasma Processing, 20:205-206.

[17] Simmons, J.H., Potter, K.S., 2000. Optical Materials. Academic Press, USA.

[18] Yan, C.S., Vohra, Y.K., Mao, H.K., Hemley, R.J., 2002. Very high growth rate chemical vapor deposition of single-crystal diamond. PNAS, 99(20):12523-12525.

[19] Yoshida, S., Motoyama, Y., Kato, I., 2004. Film Properties and PL Characteristics of Hydrogenated Amorphous Silicon Nanoball Films Fabricated Using Hydrogen-plasma. Japan Plasma Science Symp. on Plasma Processing, 21:226-227.

Open peer comments: Debate/Discuss/Question/Opinion

<1>

Please provide your name, email address and a comment





Journal of Zhejiang University-SCIENCE, 38 Zheda Road, Hangzhou 310027, China
Tel: +86-571-87952783; E-mail: cjzhang@zju.edu.cn
Copyright © 2000 - Journal of Zhejiang University-SCIENCE